Printing NIKKOR 105mm F2.8 Prototype Printing NIKKOR Printing NIKKOR lens was developed to create film duplicates of original movies for screening. It provides high resolution images with superior chromatic aberration and distortion correction and was also used for the inspection and measurement of minute patterns.
Printing NIKKOR 95mm F2.8 Prototype and 105mm F2.8 Lens performance testing system Lens performance testing system is also exhibited, including the system for testing the Ultra-Micro-NIKKOR 29.5mm F1.2 lens, which had the world's highest resolution at the time of its launch in 1964.
A photographic system that demonstrated the world's highest resolution This is a photographic system for macro imaging that was used by Professor Dr. Zyun Koana (1907 - 1985) to demonstrate the performance of high-resolution lenses, including the Ultra-Micro-NIKKOR. A variety of lenses can be used by switching adapters. The lens attached to the system is the prototype No. 5043 of the Ultra-Micro-NIKKOR 19.5mm F1.2, which was developed in 1964. This is one of three prototypes provides the best performance among them and was used for various experiments by Professor Dr. Koana. Due to the favorable reviews resulting from those experiments, Nikon began mass production of this lens. The Ultra-Micro-NIKKOR 19.5mm F1.2 achieved a resolution of 1,260 lines/mm in an imaging area of 2 mm, the highest in the world at that time.
Ultra-Micro-NIKKOR 29.5mm F1.2, N0. 5043
A photographic system that demonstrated the world's highest resolution This panel has the wrong spelling on it. The spelling of Jun Koana is incorrect. The spelling of his correct name is Zyun Koana. The father of the Ultra Micro Nikkor lenses is Professor Dr. Zyun Koana of the University of Tokyo.
Big Ultra-Micro-NIKKOR Lenses
Big Ultra-Micro-NIKKOR Lenses
Ultra-Micro-NIKKOR 250mm F1.0, 1967
Ultra-Micro-NIKKOR 225mm F1.0g, 1967
Ultra-Micro-NIKKOR 225mm F1.4, 1969
Ultra-Micro-NIKKOR 225mm F1.4 and 300mm F1.4g, 1969
Ultra-Micro-NIKKOR 300mm F1.4g, 1969
Ultra-Micro-NIKKOR 225mm F1.0 Prototype, 1969
Ultra-Micro-NIKKOR 250mm F4, 1971 Reduction Projection Lenses for Semiconductor Lithography System The Ultra-Micro-NIKKOR evolved into a projection lens for semiconductor lithography systems, providing both high resolution and a wide field of view. It contributed to the development of the Nikon NSR series, the world's leading lithography system in semiconductor fabrication. The wavelength of the light source has shortened as systems have evolved, from the g-line (436 nm) and i-line (365 nm) emitted by KrF (246 nm) and ArF (193 nm) excimer lasers and currently realized as astonishingly high resolution.
Reduction projection lenses for semiconductor lithography system
Reduction projection lens for semiconductor lithography system
Projection Lens (for NSR-1010G), 1980
Projection Lens (for NSR-1505G2A), 1984
Projection Lens (for NSR-0510G), 1986
Projection Lens (for NSR-1505G4D), 1987 Next Page Articles → Next Chapter 3 Devices and Semiconductors Shortcuts
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